This work presents the development and implementation of a Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor. The reactor construction was made from the design of each subsystem: vacuum generation stage, power supply to the discharge, ion extraction stage, gas system and heating of the substrates. The power applied to generate the discharge, essential for this type of reactor, was obtained from a microwave oven in which the magnetron is coupled to a waveguide and a resonant cavity. Some preliminary results, with the implemented reactor, were reported, which essentially consists in DLC coatings (Diamond Like Carbon) on polished silicon substrates. The coatings were characterized by atomic force microscopy - AFM and Raman spectroscopy. The results show that it is possible to obtain various amorphous molecular carbon forms. For this reason, the implementation of an inexpensive PECVD reactor is an alternative in developing research of new materials.

El presente trabajo describe el desarrollo y la implementación de un reactor de deposición química de vapor asistido por plasma PECVD (Plasma Enhanced Chemical Vapor Deposition). La construcción se realizó a partir del diseño de los diferentes componentes que lo constituyen: etapa de generación de vacío, etapa de suministro de potencia a la descarga, etapa de extracción iónica, sistema de gases y sistema de calentamiento de los sustratos. La potencia aplicada para la generación de la descarga, que es fundamental para este tipo de reactores, se obtuvo a partir de un horno microondas casero, en el que se encuentra un magnetrón acoplado a una guía de onda y a una cavidad resonante, que es la propia caja del horno microondas. Se reportan algunos resultados preliminares preparados con el reactor implementado; los cuales consisten esencialmente en recubrimientos de tipo DLC (Diamond Like Carbon) sobre sustratos de silicio pulido, que fueron caracterizados por microscopia de fuerza atómica - AFM y espectroscopia Raman. Los resultados muestran que se pueden obtener diversas formas moleculares a base de carbono, principalmente amorfas, por lo cual esta implementación de un reactor PECVD de bajo costo se convierte en una alternativa para el desarrollo de investigaciones en el área de nuevos materiales.

This work presents a study of multilayered Ti/TiN/TiC thin films obtained using a PAPVD (Plasma Assisted Physical Vapor Deposition) system by pulsed-arc discharge. For this purpose, a titanium target and a stainless steel substrate were used, placed on the cathode and on the anode, respectively, inside a vacuum chamber. To grow these films, different gases and concentrations were required. Ti is obtained with argon gas, TiN with nitrogen, and TiC with methane, at 2.5 mbar and 5 mm distance between electrodes. By means of X ray diffraction (XRD), the phases present in the film were determined, observing (111), (200), and (100) orientations for both, TiN and TiC. Also, by employing XRD techniques, Titanium Atoms Distance (DTA) was calculated at the interface of TiN and TiC, in order to study the crystallographic match. Energy Dispersive Spectroscopy (EDS) was employed in order to carry out elemental analyses in the materials. These analyses were obtained for 12 keV and 30 keV, observing the effects in the results. Taking advantage of defects generated during the growth of the multilayer, chemical composition maps were carried out, probing the combination of Ti and N in one layer and Ti and C in the other layer. Scanning Electron Microscopy (SEM) technique allowed observing the presence of the multilayer, as well as the measurement of the thicknesses of each layer, which are in the order of nanometers.